diffraction of electrons

of epitaxy processes전자재료 개발 연구실Real-time Monitoring ToolsThe MBE growth can be monitored in real-time using a Reflective High Energy Electron Diffraction (RHEED) system. The system includes an electron gun which directs an electron beam towards the substrate at a shallow angle (1-2°), and a phosphor screen which detects the diffracted beam.As the substrate surface varies (from rough to smooth) so does the pattern detected at the screen. RHEED monitorsSurface structure.Smoothness.Growth modes.Growth rates.Phase change.Orientation relations.Surface cleanness. In-

할 것이다.목 차1. Theory가. Principle of Crystalization나. XRD(X-Ray Diffraction)2. Experimental Data and analysis가. Solubility 차이의 분석나. XRD Analysis 결과3. Discussion가. Polymorphism나. L-Phenylalanine다. Solubilities라. Solution-Mediated Transformation마. Effect of Additives on Phase Trasnsformation.4. ConclusionsAnhydrate Monohydrate20 2.83 2.6730 3.1829 3.1140 3.451 3.833750 4.087 4.3098Anhydrate 20 30 40 50 2.83 3.1829000000000001 3.4510000000000001 4.0869999999999997 Monohydrate 20 30 40 50 2.67 3.11 3.8336999999999999 4.3098000000000001

of Field③ Resolution / Magnification④ Effect of convergence angle ⑤ Probe current & diameter⑥ Effect of magnification3. Procedure4. Result5. ReferenceThe Aperture size is smaller→Convengence angle is decreased→ Range of DOF is biggerSpecimenTheoryConvergence angle effect to D.O.FD.O.F1. Purpose2. Theory ① Aperture② Depth of Field③ Resolution / Magnification④ Effect of convergence angle ⑤ Probe current & diameter⑥ Effect of magnification3. Procedure4. Result5. ReferenceSpecimenTheoryProbe Current & DiameterLoss ElectronDecrease diameterThe

Electron Microscope주사전자현미경은 전자선이 시료면 위를 주사(scanning)할 때 시료에서 발생되는 여러 가지 신호 중 그 발생확률이 가장 많은 이차전자(secondary electron) 또는 반사전자(back scattered electron)를 검출하는 것으로 대상 시료를 관찰한다. SEM광원(빛)전자선파장0.006nm - ∞전파 매질진공렌즈전자 렌즈(Magnetic, electronics)분해능10 A – 30A배율10배 – 30만배Contrast 기구기하학적 현상, 물리화학적 성질The princples of SEMBackscattered electron은 전자빔

Synthesis and Characteristics of GZO/MZO thin films on pre-deposited ZnO-glass Substrates by RF Sputtering TechniqueABSTRACTThe GZO, MZO thin films were prepared on ZnO pre-sputtered glass substrate using RF Sputtering Technique. Morphological, Structural and Electrical properties of deposited films were investigated in comparison with pure ZnO Thin film by scanning electronic microscopy (SEM), Atomic force microscopy (AFM), X-ray diffraction (XRD), PL spectra and other electrical analytic method. SEM images showed all films have similar growth vertical orientations. AFM images showed the g